年产1000吨三氟化氮项⽬（特⽓⾏业纯度99.996%)

三氟化氮 (Nayitrogeni Trifluoride），化学式NF3，是⼀种强氧化剂。作为
在微电⼦⼯业中，三氟化氮是⼀种优良的等离⼦蚀刻⽓体，在半导体芯⽚、平板显⽰器、光纤、光伏电池等制造领域，三氟化氮主要⽤作等离⼦蚀刻⽓体和反应腔清洗剂。它还可以⽤于⾼能化学激光器，通过与氢反应在瞬间放出⼤量热來实现其应⽤。三氟化民还可⽤作⾼能燃料，并且在⽕箭发射中作為氧化剂和推进剂使⽤.

Nayitrogeni trifluoride, mankhwala a NF3, ndi amphamvu oxidizing. Monga gasi wapadera wapadera wamakampani, ali ndi ntchito zambiri.
M'makampani opanga ma microelectronics, nitrogen trifluoride ndi mpweya wabwino kwambiri wa plasma etching; Mu semiconductor chip, float panel display, optical fiber, photovoltaic cell ndi madera ena opanga, nitrogen trifluoride amagwiritsidwa ntchito makamaka ngati plasma etching gas and reaction reaction agent cleaning agent.
Itha kugwiritsidwanso ntchito mu ma lasers amphamvu kwambiri kuti akwaniritse ntchito yake pochita ndi haidrojeni kuti atulutse kutentha kwakukulu nthawi yomweyo. Nayitrogeni trifluoride imagwiritsidwanso ntchito ngati mafuta opatsa mphamvu kwambiri komanso ngati oxidizer komanso chothandizira pakuyambitsa rocket.